Process with high-performance Alfideox and Alficlean products
Effective etching or degreasing & etching are basic prerequisites for the successful cleaning and activation of aluminium surfaces prior to the subsequent corrosion protection process. Depending on the strength of the etching rate, this removes in particular adhering residues (such as oxides) from the raw material and optimally prepares the surface for subsequent processes. In combination with suitable Alfisid products, the etching bath becomes a degreasing & etching process and enables simultaneous cleaning in only one process step. Depending on the surface requirements, various Alfideox products are available for this purpose.
Acid-Etch AL products:
Alfideox 114
- Particularly economical etching process in spraying, dipping or waterfall process.
- Preferred application: For standard - etching requirements, low - medium etching rates.
- Ideal as a degreasing and etching process in combination with Alfisid products (Alfisid 9, 14 or 16/3).
- Optimised acid ratio based on Alfideox 74, separate fluoride additions are usually unnecessary.
- Can be switched to Alfideox 101 at any time for stronger etching demands
- Combination with Alfideox 101 for two-stage (or multi-stage) etching is possible
Alfideox 118
- Particularly economical etching process in spraying, dipping or waterfall process using evaporator technologies
- Preferred application: For standard - etching requirements, low - medium etching rates such as for awnings pretreatment
- Ideal as a degreasing and etching process in combination with Alfisid products (Alfisid 9, 14 or 16/3)
- Combination with Alfideox 82/3 for two-stage (or multi-stage) etching is possible
Alfideox 101
- For particularly high-performance etching processes in spraying, dipping or waterfall processes.
- Preferred application: For etching requirements with increased etching rates
- Can be combined with Alfisid products (Alfisid 9, 14 or 16/3) if required
- Optimal acid ratio, separate fluoride additions are usually unnecessary
- Can be used after Alfideox 114 as a second etching stage if required
Alfdeox 82/3
- For particularly high-performance etching processes in spray, immersion or waterfall processes combined with evaporator technologie
- Preferred application: For etching requirements with increased etching rates
- Can be combined with Alfisid products (Alfisid 9, 14 or 16/3) if required
- Optimal acid ratio, separate fluoride additions are usually unnecessary
- Can be used after Alfideox 118 as a second etching stage if required
Alficlean 121
Alficlean 121 is a speciality. This is not a classic, fluoride-containing etching system, but a mild, phosphoric acid based cleaning process. The one-component product does not require any additional Alfisid additives, is easy to dose and is suitable for processes where good cleaning but only low metal removal is required.
- Phosphoric acid liquid cleaner for aluminium surfaces with only slight material attack on the base material.
- The suitability for cleaning cast materials must be checked in advance.
- Especially for special cleaning tasks (e.g. for polishing paste removal) in connection with subsequent chemical polishing processes
Anwendungsbeispiele
- Single-stage degreasing & etching process at low bath temperatures, suitable for evaporator system use
- Two-stage etching process with degreasing in the first step
- For demands with increased etching rates
- Phosphoric acid cleaner prior to chemical polishing
- Without significant etching rates
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